UE49_PGM SPEEM
UE49 SPEEM
The UE49-PGM SPEEM beam line hosts a dedicated photo-electron emission microscope (PEEM) devoted to element-selective and magnetic-sensitive space resolved investigations. For a detailed description of the PEEM as well as for an overview of the experimental possibilities of our microscope, please visit the SPEEM (link in table below).
| Station data | |
|---|---|
| Temperature range | 45 - 600 K |
| Pressure range | 10-11 - 10-9 mbar |
| Weitere Details | SPEEM |
| Beamline data | |
| Segment | L08 |
| Location (Pillar) | 9.2 |
| Source | UE49 (Elliptical Undulator) |
| Monochromator | PGM |
| Energy range | 100 - 1800 eV |
| Energy resolution | 10000 at 700 eV |
| Flux | 1011 - 1013 ph/s/100 mA |
| Polarisation | variable |
| Divergence horizontal | 2.3 mrad |
| Divergence vertical | 0.79 mrad |
| Focus size (hor. x vert.) | 20 μm X 10 μm at sample position |
| User endstation | not possible |
| Distance Focus/last valve | 500 mm |
| Height Focus/floor level | 1379 mm |
| Beam availability | 12h/d |
| Phone | +49 30 8062 14750 |
At typical working conditions of the microscope the field of view is about 3 –10 µm. Therefore the highest possible photon flux within the field of view of the microscope is necessary in order to achieve high spatial resolution and maximize the collection efficiency.
The UE49-PGM SPEEM beam line allows full polarization control of the incoming beam-delivering light of circular, elliptical and horizontal polarization- in combination with a high transmittance and a careful refocusing of the photon beam. A dedicated elliptical refocusing mirror has been designed to achieving a foot print of the incoming x-ray beam on the sample of 10 μm (vertical) X 20 μm (Horizontal).
The spectral range covered extends from 80 to 1800 eV, with a spectral resolution of 10000 at 700 eV. The photon flux delivered into the focused spot ranges from 10-11 to 10-13 ph/s/100 mA.