Meier U. ; Pettenkofer C.: Morphology of the Si-ZnO Interface. Applied Surface Science 252 (2005), p. 1139-1146
Abstract:
For Si-ZnO heterostructures, prepared by magnetron sputtering the interface the morphology is studied by XPS and UPS. Magnetron sputtered ZnO films on Si(111) surfaces ( H-termination and 7x7) were prepared and investigated in well defined deposition steps and the interface properties were studied in situ. All samples are handled in situ under UHV conditions. Up to five different interface phases were detected depending on ZnO preparation. Beside a SiOx film induced by the sputter process, Zno and Zn2SiO4 phases are resolved. In addition hydrogen, appearing as Zn-OHx, is found in considerable concentrations in the films.